It is generally better to overexpose than under, as an underexposed board will never develop fully, whearas if grossly overexposed you can sometimes rescue it at development.
With silicate devloper the margin is pretty huge as long as your artwork is reasonably opaque, so you an add a decent exposure margin, like about 50% to cover uneven exposure, temperature variation etc.
You should see the exposed areas start changing colour within 15-20 secs of going into the developer. When doing test pieces to figure out optimum expose/develop conditions, start with the developer really strong, and get the exposure right first, then if necessary dilute the developer once you've worked out the ideal expose time for your UV source and laminate.
A gentle rub with
dry kitchen towel or tissue paper is about the optimum amount of abrasiveness to help remove traces of exposed resist without damage.
Unexposed resist is pretty tough and you have to try quite hard to damage it, so don't be afraid to rub quite hard.
Different brands of board can have significantly different develop times - I suspect due to resist thickness variation, but I've never had to adjust expose times for different ones.
I highly reccommend Microtrak board from
Mega