I wonder if I could use one of the high-speed (ie: high power, 1W'ish) BluRay burners to scribe a high-density pattern into a substrate as one of the first steps in creating a microelectronic mask? Currently, fabs use electron beams (and a couple other fancy high-energy beams) and a high resolution XY table stepper in order to create the initial glass mask. [One of the initial steps in IC fabrication; used to create negative masks for exposure.] Though there's no way a 405nm beam could replace a high power electron beam, surely it can do something? The Great WikiP states that the spot size is currently 580nm, though I imagine the burners use larger tolerances.
Although burners now follow a set spiral along a standardized pitch, surely the drive is capable of arbitrary positioning to within better tolerances than the pitch? For a CD, this is 1.6um -- not sure if it's different for BluRay, but this is damn small.
So, process engineers, what can I do with a 1W 405nm laser with 580nm spot size and sub-micron positioning abilities? What could it 'burn' that could be used to create high-resolution masks?