I was wondering about very precise etching, and one problem is the etch mask, but the other problem is the definition of the photoresist layer.
For simple PCB, we currently can use high speed end mills to machine copper.
But I thought of a combination process, that is using etching, but instead of photoresist, or transfer, or being reliant on printers or projectors, to use a scraper needle.
For something simple like a planar coil or other planar RF/MW structure, I was wondering what kind of 'exposure' you can get from using a needle type scribe and very strait rails as a reference to drag the needle on.
The work would be conducted under the microscope, and you might need some kind of compliant system for the scraper so it does not dig into the substrate too much, like controlled pressure by some means.
Scratches can be very fine.
I am not sure about the tool geometry, or materials choice, perhaps a single diamond crystal.
Also the mask would have to be probobly tailored to scraping. Low self healing effects.
I thought someone might find this interesting.
Kind of something like a defraction grating manufacture ?. I thought working at low temperatures might ensure proper 'removal' of the coating.