Author Topic: plasma stimulation current vs voltage source?  (Read 1265 times)

0 Members and 1 Guest are viewing this topic.

Offline sarepairman2Topic starter

  • Frequent Contributor
  • **
  • Posts: 480
  • Country: 00
plasma stimulation current vs voltage source?
« on: February 21, 2016, 01:03:53 am »
So they sell 13something MHz amplifiers for generating plasma.

If you have a plasma chamber and you connect a RF current source vs a voltage source to it, does the plasma behave differently?
How about a constant power source?
 

Offline T3sl4co1l

  • Super Contributor
  • ***
  • Posts: 21697
  • Country: us
  • Expert, Analog Electronics, PCB Layout, EMC
    • Seven Transistor Labs
Re: plasma stimulation current vs voltage source?
« Reply #1 on: February 21, 2016, 03:08:21 am »
How would you be able to do either, when the impedance varies so strongly?

Typical plasma systems use a self-tuning load match ($!!!), supplied by an amplifier that can handle very high SWR, at least for short periods.  The SWR is very high while the tuner slews to the new setpoint, which is very different between startup (no plasma = very high impedance at the coil/electrode) and operation (low impedance).

Tim
« Last Edit: February 21, 2016, 03:33:52 am by T3sl4co1l »
Seven Transistor Labs, LLC
Electronic design, from concept to prototype.
Bringing a project to life?  Send me a message!
 


Share me

Digg  Facebook  SlashDot  Delicious  Technorati  Twitter  Google  Yahoo
Smf