
The Texas Instruments OPA827 is the successor to the well-known OPA627 precision opamp. At 22MHz, the cutoff frequency of the OPA827 is slightly higher than that of the OPA627. However, the maximum slewrate is slightly lower at 28V/µs. The offset voltage of the OPA827 is lower even without binning. The input noise has also been reduced slightly.

The January 2007 issue of New Electronics magazine features an article on the BiCom3HV process. It mentions the OPA827, which is also based on this process. Details on the BiCom3HV process can be found in the IEEE publication “BiCom3HV - A 36V Complementary SiGe Bipolar and JFET Technology.” The above sketch, which shows how an NPN transistor is constructed in this process, was also published there. These transistors block up to 40V. The use of SiGe also enables high switching frequencies. The transition frequency is up to 4,2GHz. This is an SOI (Silicon on Insulator) process, which means that the parasitic capacitances are largely independent of the applied voltage.

The datasheet contains a circuit diagram that is similar to the circuit diagram of the OPA627. The OPA627 had p-channel JFETs at the inputs. Here, there are n-channel JFETs that are directly connected to the positive supply. The additional input transistors were also present in the OPA627, but are not yet shown in the datasheet. With the TO-99 package, the OPA627 offers two additional contacts to adjust the current distribution in the current mirror and thus the offset voltage. This interface has been omitted in the OPA827.

The dimensions of the die are 1,7mm x 1,3mm. It is therefore significantly smaller than the die in the OPA627 (2,9mm x 2,0mm). Most of the surface area has been filled with dummy structures. Nevertheless, the input transistors are clearly visible. Like the OPA627, the OPA827 also works with a large number of relatively large input transistors. The large surface area ensures low noise. The circuitry reduces offsets that could otherwise arise due to temperature gradients. In the top metal layer, the input transistor area is recognizable by its symmetrical, relatively wide lines. The two bondpads on the lower edge in the left area represent the inputs. The wide connections to the input transistors are clearly visible.
The output stage is located on the right edge. It stands out due to its even wider lines. The central placement ensures the most homogeneous temperature gradients possible in the input transistors. It appears that separate bondpads have been integrated to supply the output stage.
Three bondpads remain unconnected in the left-hand section. The bondpad located slightly further inside the die has no protective structures. This potential is probably only used for testing or calibration purposes. The two bondpads in the left-hand corners are equipped with protective structures. Perhaps an offset calibration could be performed on them, as with the OPA627.
This image is also available in higher resolution:
https://www.richis-lab.de/images/Opamp/a15x03XL.jpg (92MB)

IC05118 appears to be the internal project designation. Rectangles have been drawn all over it in various places.

The die contains several laser-matched resistors, similar to those found in the OPA140, among others.
Also interesting are the interconnected squares above the resistor, which resemble fuses. These are certainly not fuses, as the passivation layer completely covers the structure. One can only assume that these are auxiliary structures that can be used during development or troubleshooting. In these situations, opening the passivation layer and modifying the metal layer is a reasonable effort.

If the upper layers are removed, it becomes apparent that large areas do not contain any active elements.
This image is also available in a higher resolution:
https://www.richis-lab.de/images/Opamp/a15x06XL.jpg (26MB)

The lowest structures of the input transistors are still partially intact. There are 20 large and 8 small blocks.
https://www.richis-lab.de/OpampA10.htm 