NPN and PNP with similar build (i.e., those will be N and P substrate, then P/N, then N/P, epitaxy or diffusion) have similar properties. PNP is only like 10-20% lower performance, I've forgotten exactly why now but clearly electrons and holes participate in the same way and mobility is a smaller factor in operation.
Want to say base diffusion is the only step in a BJT where mobility really matters, and the base can simply be made thinner if needed. If that's the case, we might expect to find stronger Early effect; or, it's further compensated by collector doping profile, with subtle effects on breakdown voltage, Ccb(Vcb) and voltage drop, Idunno.
If a process is limited by shitty (usually lateral) PNP, large areas might be needed to compensate for that.
Complementary MOSFETs will always differ by about a factor of two, because mobility is a direct proportion in their performance.
Tim