Wow, the high-res picture looks astonishing in full screen!

Stare at it for too long, and now I have so many questions.
-1. Was the chip functional? Asking because the metal traces looks fractured many times, from one edge to other, particularly in the most wide traces. Are those crack-lines going deep enough into the metal layer, so to interrupt its continuity?
-2. Another thing, trying to match the die pics with typical CMOS gate structures in TI application notes. This one is about the MOSFETs area ratio:
https://www.ti.com/lit/an/scla011/scla011.pdfHC vs HCT input MOSFETs area - Fig.6 from scla011 pdf - TI

The threshold voltage of a CMOS circuit is determined by the geometry of the input transistors. These transistors are designed to sink the same input current at the required threshold voltage. The resulting voltage at the output is equivalent to 50% of the supply voltage VCC . For an HC circuit, the channel width of the p-channel transistor of the input is approximately twice the value of an n-channel transistor. The purpose is to make both transistors have the same current characteristics, thus making the threshold voltage of their input at about 50% of the supply voltage VCC . This circuit area has been modified for HCT devices: the n-channel transistor is about seven times wider than the p-channel transistor (see Figure 6). This shifts the threshold voltage in a way that it amounts to 30% of the supply voltage. At a supply voltage VCC = 5 V, the threshold voltage is VT = 1.5 V, similar to the threshold voltage of TTL circuits.
The area ratio was easy to confirm for the output MOSFETs: M22 on the die (or M20 in the schematic, I guess that's a numbering typo) is indeed about twice the size of the M21 (same as the HC series would require for its input MOSFETs, because the output of HCT series has a symmetric characteristic of N vs P channel MOSFET).
Now, for the input MOSFETs of this 74HCT14, the area ratio has to be about 1:7 for P vs N channel MOSFETs, according to the same Fig.6 above. In the schematic, there is (M7+M8) for P channel, and the parallel (M2+M3) || (M4+M5). So, the area of (M7+M8) vs (M2+M3) should be about 1:3.5, did I got it right so far?
The question is: When looking at the annotated dieshot, M3 seems to be made of 2 identical structures in parallel. Is M3 (on the die) made out of 2 parallel MOSFETs? (same question for M2). Asking because my skill of identifying transistors on a die are practically zero.
-3. Another question, you say one can almost see the doping wells. How visible is that, or how to recognize the wells borders? Is it the green thing in the high res pic?
Asking because I'm trying to match the die layout with this expected layout from Figure 15 in
https://www.ti.com/lit/an/scla007a/scla007a.pdf :

One page before Fig.15 above, the TI AN describes 2 possible types of ESD protection. Would be interesting to see how much of that can be matched with this 74HCT14 die,
particularly since this model is a rad-hard chip (doh, my bad, I notice now this 74HC14 is a normal DIL14, no Mech-Pak carrier). I have another set of questions about that, but this post is already too long.